Plasma processing apparatus employing a textured focus ring

Details Plasma processing apparatus employing a textured focus ring Plasma processing apparatus employing a textured focus ring

1994-03-08

1995-12-12

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 216 67, 216 71, 118723R, 20429831, H05H 100

Patent

active

054746493

ABSTRACT:
The invention is directed to a focus ring for surrounding a workpiece/surface substrate during plasma processing comprising a hollow annular assembly comprised of electrically insulating material and having a texturized surface. The texturized ring is preferably in the geometry of a generally cylindrical structure. The texturizing of the ring can be effected by any means of surface abrasion including bead blasting or chemical etching.

REFERENCES:
patent: 4793975 (1988-12-01), Drage
patent: 4975327 (1990-12-01), Somasiri et al.
patent: 5001327 (1991-03-01), Hirasawa et al.
patent: 5246532 (1993-09-01), Ishida
patent: 5316620 (1994-05-01), Hasegawa et al.

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