Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate
2011-04-12
2011-04-12
Kackar, Ram N. (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With measuring, sensing, detection or process control means
C156S345440, C118S7230AN, C118S7230ER
Reexamination Certificate
active
07922862
ABSTRACT:
A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process gas into the process container. An electric field formation system is configured to form an RF electric field within the process container so as to generate plasma of the process gas. A number of protrusions are discretely disposed on a main surface of the first electrode and protrude toward a space where the plasma is generated.
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Himori Shinji
Matsumaru Hiroki
Matsuyama Shoichiro
Nagaseki Kazuya
Okumura Katsuya
Kackar Ram N.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Octec Inc.
Tokyo Electron Limited
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