Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate
2008-11-26
2011-11-22
Alejandro, Luz L. (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With radio frequency antenna or inductive coil gas...
C118S7230IR, C118S7230IR
Reexamination Certificate
active
08062473
ABSTRACT:
A plasma processing apparatus includes in a processing chamber, a sample stage, a bell jar, a coil antenna, a Faraday shield, and a gas ring member located below a skirt portion of the bell jar and above the sample stage. The gas ring member supplies a process gas to a plasma generating space inside the bell jar from a gas port disposed on an inner surface of the gas ring member. A ring shaped plate is disposed near a periphery of the Faraday shield and having an inner surface facing and covering along the inner surface of the gas ring member and being spaced from the inner surface of the gas ring member so as to delimit a gap therebetween.
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Kanai Saburou
Kanekiyo Tadamitsu
Kihara Hideki
Nishio Ryoji
Okuda Koji
Alejandro Luz L.
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
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