Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1996-05-24

1997-12-16

Tsai, Jey

Coating apparatus

Gas or vapor deposition

With treating means

118723MP, C23C 1600

Patent

active

056980361

ABSTRACT:
A plasma processing apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the wave guide and disposed in the container to face a semiconductor wafer supported in the container. The antenna includes a plurality of short slits concentrically or spirally arranged in the antenna. The slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave, and each of the slits has a length of +30% of the guide wavelength centered with respect to half of the guide wavelength.

REFERENCES:
patent: 5364519 (1994-11-01), Fujimura et al.
patent: 5538699 (1996-07-01), Suzuki
patent: 5545258 (1996-08-01), Katayama et al.
patent: 5562775 (1996-10-01), Mihara

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