Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1996-10-23

1997-09-09

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118725, 118728, C23C 1600

Patent

active

056651660

ABSTRACT:
Disclosed is a plasma processing apparatus, comprising a first electrode on which an object to be processed is to be disposed, a second electrode arranged to face the first electrode, a high frequency power supply for supplying a high frequency power between the first and second electrodes, a processing gas supplying mechanism for forming a plasma into a region between the first and second electrodes, and a bias potential detecting mechanism for detecting the bias potential of the first electrode. The bias detecting mechanism has a detecting terminal positioned in the vicinity of the object to be processed.

REFERENCES:
patent: 4933063 (1990-06-01), Katsura
patent: 5203945 (1993-04-01), Hasegawa
patent: 5213658 (1993-05-01), Ishida
patent: 5273610 (1993-12-01), Thomas
patent: 5340460 (1994-08-01), Kobayashi
patent: 5382311 (1995-01-01), Ishikawa
patent: 5433813 (1995-07-01), Kuwabara

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