Plasma processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Reexamination Certificate

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Details

C156S345420, C118S7230MW, C118S7230MR, C118S7230AN

Reexamination Certificate

active

06866747

ABSTRACT:
On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma processing apparatus can be provided that performs a highly uniform plasma process and is excellent in terms of plasma generation property.

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patent: 5861601 (1999-01-01), Sato et al.
patent: 5874706 (1999-02-01), Ishii et al.
patent: 6189481 (2001-02-01), Akimoto
patent: 6726802 (2004-04-01), Tadera et al.
patent: 05036641 (1993-02-01), None
patent: 9-232099 (1997-09-01), None
patent: 2000-091097 (2000-03-01), None

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