Plasma process device

Details Plasma process device Plasma process device

1997-09-11

2000-01-18

Bell, Bruce F.

Coating apparatus

Gas or vapor deposition

With treating means

156345, 20429837, C23C 1600

Patent

active

060149434

ABSTRACT:
A plasma process device includes a process vessel having a plasma generating area therein, a susceptor provided in the process vessel for supporting a substrate having a process surface, and a gas inlet means for introducing a process gas into the plasma generating area. A dipole ring magnet is arranged around the outer periphery of the process vessel, for generating a magnetic field having a magnetic line of force in the plasma generating area, so that a plasma of the process gas is generated in the plasma generating area. The dipole ring magnet has a plurality of anisotropic segment magnets arranged on an oval track, which are cylindrical permanent magnets having the same shape and size and magnetized in the diameter direction.

REFERENCES:
patent: 5444207 (1995-08-01), Sekine et al.
patent: 5519373 (1996-05-01), Miyata
patent: 5717294 (1998-02-01), Sakai et al.

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