Plasma process and apparatus

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C315S111710

Reexamination Certificate

active

06897615

ABSTRACT:
An apparatus and process for enhancing the ignition of a gas to form a plasma in a plasma tool. The apparatus and process includes the use of a plasma tube to locally enhance the applied electric field so that plasma can be initiated at higher pressures, at lower electric fields, and/or in otherwise difficult gases to ignite. The plasma tube includes at least one conductive fiber secured to the tube. A process for enhancing the local electric field includes coupling the plasma tube to an energy source such as microwave energy, radiofrequency energy, or a combination comprising at least one of the foregoing energy sources.

REFERENCES:
patent: 4047064 (1977-09-01), Cosco et al.
patent: 4447958 (1984-05-01), Tanaka
patent: RE32626 (1988-03-01), Yoshizawa et al.
patent: 4762603 (1988-08-01), Morin
patent: 4863576 (1989-09-01), Collins et al.
patent: 4922099 (1990-05-01), Masuda et al.
patent: 5639565 (1997-06-01), Boyd et al.
patent: 5686793 (1997-11-01), Turner et al.
patent: 5847517 (1998-12-01), Ury et al.
patent: 5892328 (1999-04-01), Shang et al.
patent: 6084348 (2000-07-01), Love
patent: 6239553 (2001-05-01), Barnes et al.
patent: 6351070 (2002-02-01), Barry
patent: 0 002 848 (1981-05-01), None
patent: 57055057 (1982-04-01), None
patent: 57202644 (1982-12-01), None
patent: 58005960 (1983-01-01), None
patent: WO 9856213 (1998-12-01), None
patent: WO 9908865 (1999-02-01), None
patent: WO0030142 (2000-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plasma process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma process and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3422997

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.