Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1995-05-02
1997-07-08
Lee, Benny T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
118723MW, 118723ME, 118723MR, 156345, 31323131, 333998L, H05H 146
Patent
active
056464894
ABSTRACT:
A plasma processing apparatus has a waveguide along which microwaves are propagated from a microwave generator to a plasma-forming region in a low-pressure processing chamber. The waveguide has a large cross-sectional area, to enable a large region of plasma to be achieved. Uniformity and stability of the plasma are improved by a mode restrictor which inhibits mixing of propagation modes which is otherwise liable to occur in a wide waveguide. The mode restrictor consists of electrically conductive dividers which divide the waveguide cross-section into an array of sub-guides before the plasma-forming region.
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Enami Hiromichi
Kaji Tetsunori
Kakehi Yutaka
Kawasaki Yoshinao
Nojiri Kazuo
Bettendorf Justin P.
Hitachi , Ltd.
Lee Benny T.
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