Plasma generating method and apparatus and plasma processing met

Details Plasma generating method and apparatus and plasma processing met Plasma generating method and apparatus and plasma processing met

1994-09-16

1996-12-03

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 216 69, 216 70, H01L 2100

Patent

active

055804209

ABSTRACT:
A microwave penetrating window and a cavity which are substantially equal in diameter to a plasma generating chamber are successively connected to the plasma generating chamber and microwaves are introduced via the cavity into the plasma generating chamber. A processing gas in the plasma generating chamber is converted into a plasma by means of the microwaves introduced into the plasma generating chamber and the microwaves in specific modes are resonated in between a microwave reflective interface with the plasma generated in the plasma generating chamber and the reflective edge face of the cavity. The microwaves in the specific modes are thus formed in the cavity and the energy of the microwaves in the specific modes is increased by resonance. The boosted energy is added to the plasma and the plasma is densified accordingly. Moreover, a plasma excellent in uniformity and stability can be generated by resonating the microwaves in the specific modes in the presence of a uniform electromagnetic field.

REFERENCES:
patent: 4866346 (1989-09-01), Gaudreau et al.
patent: 5160397 (1992-11-01), Doki et al.
Microwave Plasma Etching System Sep. 1991 Japan.

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