Plasma generating apparatus and method using modulation system

Details Plasma generating apparatus and method using modulation system Plasma generating apparatus and method using modulation system

1990-07-31

1992-02-11

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31323131, H05H 124

Patent

active

050878573

ABSTRACT:
The present invention provides a plasma generating method by using a modulation system in order to improve inner uniformity of plasma in plasma generating apparatus using the ECR plasma apparatus of another ECR system for performing an etching or deposition process. Unlike conventional fixed current systems, the embodiment disclosed transfers a high density ion portion to radiation form, thereby improving the uniformity of etching velocity or depositing velocity in wafers.

REFERENCES:
patent: 4818916 (1989-04-01), Morrisroe
patent: 4829215 (1989-05-01), Kim et al.
patent: 4911814 (1990-03-01), Matsuoka et al.
patent: 4947085 (1990-08-01), Nakanishi et al.
patent: 4950956 (1990-08-01), Asamaki et al.

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