Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1992-06-11
1994-07-19
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427575, 427569, 427249, 427122, 428408, 423446, B05D 306, C23C 1626
Patent
active
053308026
ABSTRACT:
A plasma CVD method for forming a carbonaceous material containing diamond or microcrystalline grains therein is disclosed, which comprises placing a substrate in a reaction chamber said substrate provided with reduced Ni, Ge, or Mn on its surface; inputting a carbon compound gas into said reaction chamber; supplying an electric energy to said gas to convert said gas to a plasma; and forming said cabonaceous material on said substrate, wherein said reduced Ni, Ge, or Mn act as seeds on said surface of said substrate to promote formation of said carbonaceous material.
REFERENCES:
patent: 4683838 (1987-08-01), Kimura et al.
patent: 4734339 (1988-03-01), Schachner et al.
patent: 4745031 (1988-05-01), Nakayama et al.
patent: 5183685 (1993-02-01), Yamazaki
Kawarada et al "Large Area Chemical Vapor Deposition of Diamond Particles and Films Using Magneto-Microwave Plasma" Jpn. J. Appl. Phys. 26(6) Jun. 1987 L1032-1034.
Kindai Henshu-sha, Carbon Fibers (Sugio Otani et al., 1983) with English translation of relevant portion of Chapter II.
King Roy V.
Semiconductor Energy Laboratory Co,. Ltd.
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