Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
Inventor
active
Carbon deposition by ECR CVD using a catalytic gas
Diamond film deposition by ECR CVD using a catalyst gas
Electric circuit having superconducting layered structure
Electric circuit having superconducting multilayered structure a
Elongated superconductive member
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Profile ID: LFUS-PAI-P-16363