Physical vapor deposition reactor with circularly symmetric...

Details Physical vapor deposition reactor with circularly symmetric... Physical vapor deposition reactor with circularly symmetric...

2008-10-17

2011-12-06

Hendricks, Keith (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298160

Reexamination Certificate

active

08070925

ABSTRACT:
In a PVD reactor having a sputter target at the ceiling, a conductive housing enclosing the rotating magnet assembly has a central port for the rotating magnet axle. A conductive hollow cylinder of the housing surrounds an external portion of the spindle. RF power is coupled to a radial RF connection rod extending radially from the hollow cylinder. DC power is coupled to another radial DC connection rod extending radially from the hollow cylinder.

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patent: 2001/0052455 (2001-12-01), Hong
patent: 2002/0162737 (2002-11-01), Durs
patent: 2006/0169582 (2006-08-01), Brown et al.
patent: 2008/0023318 (2008-01-01), Kuroiwa
patent: 2008/0121516 (2008-05-01), Sarkar et al.
patent: 2010/0032289 (2010-02-01), Wang et al.

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