Photosensitizers for polysilanes

Details Photosensitizers for polysilanes Photosensitizers for polysilanes

1991-03-04

1993-04-20

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, G03F 730

Patent

active

052042260

ABSTRACT:
The present invention relates to positive resist compositions comprising polysilanes and sulfosuccinimide photosensitizers and the use of these compositions in making integrated circuits.

REFERENCES:
patent: 3163534 (1964-12-01), Adams et al.
patent: 3767628 (1973-10-01), Kline et al.
patent: 3932352 (1976-01-01), Freedman et al.
patent: 4009324 (1977-02-01), Freedman et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4544729 (1985-10-01), Nate et al.
patent: 4587205 (1986-05-01), Harrah et al.
patent: 4618564 (1986-10-01), Demmer et al.
patent: 4639480 (1987-01-01), Birum et al.
patent: 4957988 (1990-09-01), Irving et al.
patent: 5002853 (1991-03-01), Aoai et al.
Rosilio, C. et al., "Contribution to the Study of Polysilanes for Photography", Microelectric Engineering 6 (1987) 399-406.
Miller, R. D. et al., "Soluble Polysilane Derivative: Interesting New Radiation-Sensitive Polymers", American Chemical Socieity, 1984.
Diaz, A., et al., "Electrooxidation of Submitted Silane High Polymers", Polymer Prepr. (American Chem. Soc. Div. Polym. Chem., 1985, 26(1) 125-6 (Eng.) CA 103:88297f (only Abstract) given and considered.
Taylor, G. et al., "Lithographic Photochemical and Oxygen RIE Properties of Three Polysilane Copolymers", Proc. SPIE Int. Soc. Opt. Eng., 1988 Adv. Resist Technol. Process 5, 274-90 (Eng.) Abstract only CA 110:182759z.
Hayase et al., "Polysilane Compound and Bilayer Photoresist Containing It", JP Appl., 87/122,409, 21 May 1987, Dec. 1988 (Abstract only) CA 111:31346g.
Miller, R. D., "Radiation Sensitivity of Soluble Polysilane Derivatives", Adv. Chem. Ser. 1987 (pub. 1990) Abstract only 112: 128881m.
Ito, et al., "Photosensitive Resin Compositions for Fine Patterning", JP 88/134,264, May 31, 1988, 10 pp. Abstract only CA 113: 32000t.
Miller, et al., "Polysilane High Polymers", IBM Res. Div. Alamden, San Jose, American Chemical Society, 1989.

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