Photosensitive resinous materials containing stilbazolium groups

Details Photosensitive resinous materials containing stilbazolium groups Photosensitive resinous materials containing stilbazolium groups

1981-04-14

1982-07-13

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 28, 525 61, 525375, G03C 168

Patent

active

043395244

ABSTRACT:
A partially saponified polyvinyl acetate having at least one stilbazolium group-containing photosensitive unit represented by the following general formula: ##STR1## (wherein R.sub.1 is hydrogen atom, an unsubstituted or substituted alkyl group, an alkenyl group or an aralkyl group, R.sub.2 is hydrogen atom or an unsubstituted or substituted alkyl group, Y is a conjugated base of an inorganic or organic acid, m is an integer of 1 to 6, and n is 0 or 1) and an acetal unit represented by the following general formula: ##STR2## (wherein R.sub.3 is hydrogen atom or an alkyl group); the acetal units being contained therein in an amount of approximately 0.5 to 10.0 mol % with respect to mole of the polyvinylalcohol units thereof; the stilbazolium group-containing units being contained therein in an amount of approximately 0.5 to 5.0 mol % with respect to mole of the polyvinylalcohol units thereof; and having a degree of polymerization of approximately 500 to 3,000 and a degree of saponification of approximately 60% or higher. This polyvinyl acetate can be used as photosensitive resinous materials or compositions suitable for the fluorescent screen of a cathode ray tube.

REFERENCES:
patent: 3514421 (1970-05-01), Kershaw et al.
patent: 3649269 (1972-03-01), Kubota
patent: 4131465 (1975-12-01), Petropoulos

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