Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2009-01-09
2009-11-03
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S270100, C430S005000, C430S396000, C430S905000, C430S280100, C430S286100
Reexamination Certificate
active
07611826
ABSTRACT:
The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
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Kim Gil-Lae
Park Chan-Seok
Park Choon-Ho
Rho Soo-Guy
Yang Seok-Yoon
Cantor & Colburn LLP
Samsung Electronics Co,. Ltd.
Walke Amanda C.
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