Photosensitive polysilazane composition, method of forming...

Details Photosensitive polysilazane composition, method of forming... Photosensitive polysilazane composition, method of forming...

2005-06-07

2005-06-07

Kelly, Cynthia H. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S326000, C430S270100, C430S905000, C430S914000, C430S919000, C430S920000, C430S921000, C430S926000, C430S330000, C430S328000, C430S311000, C430S317000

Reexamination Certificate

active

06902875

ABSTRACT:
A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: —[SiR6(NR7)1.5]— and other constituent units represented by the general formula: —[SiR62NR7]— and/or —[SiR63(NR7)0.5]— (R6and R7independently represent a hydrogen atom, a C1-3alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

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