Photosensitive polymer including fluorine, resist...

Details Photosensitive polymer including fluorine, resist... Photosensitive polymer including fluorine, resist...

2005-08-23

2005-08-23

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000, C526S242000, C526S271000, C526S281000, C526S314000, C526S244000, C526S248000, C526S319000

Reexamination Certificate

active

06933096

ABSTRACT:
A photosensitive polymer including fluorine, a resist composition containing the same and a patterning method for IC fabrication using the resist composition are provided. The photosensitive polymer having at least one selected from the group consisting of fluorine-substituted or unsubstituted alkyl ester, tetrahydropyranyl ester, tetrahydrofuranyl ester, nitrile, amide, carbonyl and hexafluoro alkyl having a hydrophilic group, and a trifluorovinyl derivative monomer as a repeating unit and having a weight average molecular weight of about 3,000 to about 100,000. The photosensitive polymer exhibits high transmittance for a light source of F2(157 nm), high dry etching resistance, and has characteristics suitable to realize an unitrafine pattern size.

REFERENCES:
patent: 2004/0012089 (2004-01-01), Rantala et al.

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