Photosensitive polymer having cyclic backbone and resist composi

Details Photosensitive polymer having cyclic backbone and resist composi Photosensitive polymer having cyclic backbone and resist composi

1999-07-08

2000-11-07

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 526272, 526281, G03F 7004, C08F 1000

Patent

active

061434655

ABSTRACT:
A photosensitive polymer represented by the following formula, and a resist composition including (a) a photosensitive polymer represented by the following formula: ##STR1## where R.sub.1 is a C.sub.1 to C.sub.20 aliphatic hydrocarbon, R.sub.2 is t-butyl, tetrahydropyranyl or 1-alkoxy ethyl, 1/(1+m+n) is from 0.0 to about 0.4, m/(1+m+n) is 0.5, and n/(1+m+n) is from about 0.1 to about 0.5, and (b) a photoacid generator (PAG).

REFERENCES:
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 6028153 (2000-02-01), Jung
patent: 6063542 (2000-05-01), Hyeon et al.
Alicyclic Polymers for 193nm Resist Applications, Okoroanyanwu, U. et al., Chem. Mater. 1998, 10, 3319-3327.
New Positive Resists with Cycloaliphatic Structures in the Main Chain, Meyer, U. et al, Euro.Pol.J., 1999, 35, 69-76.

Affiliated with

Also associated with

Rating

Photosensitive polymer having cyclic backbone and resist composi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive polymer having cyclic backbone and resist composi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polymer having cyclic backbone and resist composi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1638984