Photosensitive members and a process for forming patterns using

Details Photosensitive members and a process for forming patterns using Photosensitive members and a process for forming patterns using

1980-06-30

1982-10-26

Bowers, Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430190, 430191, 430192, 430326, 430328, 430330, G03C 500, G03C 708, G03C 1495, G03C 160, G03C 518

Patent

active

043562558

ABSTRACT:
A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.

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patent: 4164421 (1979-08-01), Shinozaki et al.
patent: 4196003 (1980-04-01), Watanabe
patent: 4259430 (1981-03-01), Kaplan et al.
patent: 4275139 (1981-06-01), Stahlhofer

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