Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1999-12-08
2000-10-31
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430165, 430192, 430193, G03F 730
Patent
active
061400262
ABSTRACT:
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.
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Blakeney Andrew J.
Ferreira Lawrence
Jeffries, III Alfred T.
Medina Arturo N.
Naiini Ahmad A.
Arch Specialty Chemicals, Inc.
Chu John S.
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