Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-05-24
2005-05-24
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S316000, C430S317000, C430S318000
Reexamination Certificate
active
06897011
ABSTRACT:
A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.
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Hiroo et al, Publication No. 10-239840, Patent Abstracts of Japan with attached English Machine translation of said document which is for Japanese 10-239840 published Sep. 11, 1998, pp. 2of2, 1of1, 1of1 and 1-14 copyright Japan Patent Office.*
Derwent-ACC-No: 1998-546328, English abstract of JP 10239840A, 2 pages, copyright 1999, Derwent Information LTD.
Kumazawa Akira
Mizusawa Ryuma
Nakazato Syunji
Obiya Hiroyuki
Fish & Richardson P.C.
Hamilton Cynthia
Tokyo Ohka Kogyo Co. Ltd.
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