Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-07-18
2006-07-18
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S287100, C430S285100, C430S325000, C430S315000, C430S329000, C430S331000, C430S916000
Reexamination Certificate
active
07078157
ABSTRACT:
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.
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Invitation to Pay Additional Fees (Form PCT/ISA/206).
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Lu Ping-Hung
Oberlander Joseph E.
Plass Robert R.
Wanat Stanely F.
Zhuang Hong
AZ Electronic Materials USA Corp.
Kass Alan P.
Lee Sin
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