Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2011-04-26
2011-04-26
Kelly, Cynthia H (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S281100, C430S324000, C430S329000
Reexamination Certificate
active
07932016
ABSTRACT:
Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.
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Ibbitson Scott A.
Liu Xiang-Qian
Okada-Coakley Janet
Steeper Jill E.
Winkle Mark R.
Baskin Jonathan D.
Eoff Anca
Kelly Cynthia H
Rohm and Haas Electronic Materials LLC
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