Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-02-09
2000-08-29
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430176, 4302711, 4302731, 430325, 430326, 430910, 522153, G03C 173
Patent
active
061106372
ABSTRACT:
A photoresist suitable for the production of structures in the submicron range contains the following components:
REFERENCES:
patent: 4293636 (1981-10-01), Okuya
patent: 4472494 (1984-09-01), Hallman et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4508812 (1985-04-01), Brault
patent: 4680244 (1987-07-01), Lehmann et al.
patent: 4837124 (1989-06-01), Wu et al.
patent: 4912018 (1990-03-01), Osuch et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5120629 (1992-06-01), Bauer et al.
patent: 5384220 (1995-01-01), Sezi et al.
Ito, H. and M. Ueda, "Thermolysis and Photochemical Acidolysis of Selected Polymethacrylates", Macromolecules, 1988, 21, 1475-1482.
English Translation of JP 53-81116.
EP 0 388 484, Sebald et al. English Translation, Sep. 1990.
EP 394,740--Sezi et al. English Translation Oct. 1990.
Ahne Hellmut
Birkle Siegfried
Borndoerfer Horst
Leuschner Rainer
Sebald Michael
Codd Bernard
Siemens Aktinegesellschaft
LandOfFree
Photoresists which are suitable for producing sub-micron size st does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresists which are suitable for producing sub-micron size st, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresists which are suitable for producing sub-micron size st will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1248029