Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-03-18
2010-10-05
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
Reexamination Certificate
active
07807340
ABSTRACT:
A method of creating patterned objects using a class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I):where Ar1and Ar2are independently selected from monocyclic aryl and monocyclic heteroaryl, R1and R2may be the same or different, and have the structure —X—R3where X is O or S and R3is C1-C6hydrocarbyl or heteroatom-containing C1-C6hydrocarbyl, and R4and R5are independently selected from the group consisting of hydrogen and —X—R3, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar1, Ar2, or R3is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.
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Breyta Gregory
Dawson Daniel Joseph
Larson Carl E.
Wallraff Gregory Michael
Bozicevic Field & Francis LLP
Duda Kathleen
International Business Machines - Corporation
Raymond Brittany
Rutenberg Isaac M.
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