Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-04-04
2006-04-04
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S907000, C526S242000, C526S271000, C526S281000
Reexamination Certificate
active
07022458
ABSTRACT:
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness).whereinX1, X2, X3, R1, R2, R3, R4, R5, m, n, o, a, b, c, d and e are as defined in the description.
REFERENCES:
patent: 6403281 (2002-06-01), Lee et al.
patent: 6461789 (2002-10-01), Hatakeyama et al.
patent: 2002/0146638 (2002-10-01), Ito et al.
patent: 2003/0068573 (2003-04-01), Takata et al.
Bok Cheol Kyu
Kang Jae Hyun
Kim Jae Hyun
Kim Jung Woo
Lee Geun Su
Ashton Rosemary
Dongjin Semichem Co., Ltd.
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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