Photoresist materials and photolithography process

Details Photoresist materials and photolithography process Photoresist materials and photolithography process

2011-07-05

2011-07-05

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S910000

Reexamination Certificate

active

07972761

ABSTRACT:
A material for use in lithography processing includes a polymer that turns soluble to a base solution in response to reaction with acid and a plurality of magnetically amplified generators (MAGs) each having a magnetic element and each decomposing to form acid bonded with the magnetic element in response to radiation energy.

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Taiwanese Patent Office, Office action of May 10, 2010, Application No. 095142454, 7 pages.

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