Photoresist layer supporting film and photoresist film laminate

Details Photoresist layer supporting film and photoresist film laminate Photoresist layer supporting film and photoresist film laminate

1997-05-13

1999-11-30

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302751, 4302771, 4302781, 430533, G03C 1795

Patent

active

059940271

ABSTRACT:
A photoresist layer supporting film is (A) formed from a polymer composition comprising (i) 55 to 100% by weight of a copolyester containing ethylene terephthalate units as a main recurring unit and having a melting point of 210 to 250.degree. C. and (ii) 0 to 45% by weight of polybutylene terephthalate or a copolyester containing butylene terephthalate units as a main recurring unit and having a melting point of not lower than 180.degree. C. and (B) has a plane orientation coefficient of 0.08 to 0.16. Since this supporting film is excellent in substrate shape follow-up properties and resolution, it is suitable for the preparation of a photoresist film laminate by laminating a protective film and a photoresist layer on the surface thereof.

REFERENCES:
patent: 4302268 (1981-11-01), Tachiki et al.
patent: 5179854 (1993-01-01), Matsui et al.
patent: 5384354 (1995-01-01), Hasegawa et al.
patent: 5618621 (1997-04-01), Hasegawa et al.

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