Photoresist film for deep ultra violet and method for forming ph

Details Photoresist film for deep ultra violet and method for forming ph Photoresist film for deep ultra violet and method for forming ph

1998-12-29

2000-07-11

Cho, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430910, G03F 7004, G03F 730

Patent

active

060870656

ABSTRACT:
A photoresist film superior in etch resistance and PED stability, as well as transmittance to deep UV, having a backbone of polymethylmethacrylate grafted with piperidine moiety of which the nitrogen atom acts as a base.

REFERENCES:
patent: 4283509 (1981-08-01), Zweifel et al.
patent: 5334485 (1994-08-01), Van Iseghem et al.
patent: 5888698 (1999-03-01), Koh et al.

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