Photoresist developers and process

Details Photoresist developers and process Photoresist developers and process

1980-05-05

1982-02-02

Weinblatt, Mayer

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430275, 430276, 430278, 430331, 430526, 252 795, G03C 500

Patent

active

043140220

ABSTRACT:
A developing solution for use with imaging film comprising a photoresist layer over an aluminum coated substrate and the process of developing the film are shown to be rapid acting. The developing solution comprises an aqueous solution having a pH of at least 12.5 of an alkali metal hydroxide and a chelating agent having a stability constant for Al.sup.+3 of at least 6.70.

REFERENCES:
patent: 3475171 (1969-10-01), Alles
patent: 3957583 (1976-05-01), Smith
patent: 4008084 (1977-02-01), Ikeda et al.
patent: 4078102 (1978-03-01), Bendz et al.
patent: 4094679 (1978-06-01), Washizawa et al.
patent: 4193797 (1980-03-01), Cohen

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