Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1991-10-22
1993-12-07
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430331, G03F 730, G03F 732
Patent
active
052682609
ABSTRACT:
Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
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Bantu Nageshwer R.
Bhatt Anilkumar C.
Bhatt Ashwinkumar C.
Jones Gerald W.
Kotylo Joseph A.
Dote Janis L.
Goldman Richard M.
International Business Machines - Corporation
McCamish Marion E.
Olsen Judith
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