Photoresist copolymer

Details Photoresist copolymer Photoresist copolymer

1997-10-21

1999-11-09

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 525205, 525221, 525222, G03C 1492, C08L 3500

Patent

active

059811420

ABSTRACT:
A copolymer useful as a photoresist resin for submicrolithography, comprising glutarimide derivatives and acrylic acid derivatives as shown in Formula I and a photoresist composition comprising the same. ##STR1## wherein, R.sub.1 is a straight or branched alkyl group containing 0-30 carbon atoms; R.sub.2 and R.sub.3 independently represent straight or branched alkoxy or cycloalkoxy groups containing 1-15 substituted or non-substituted carbon atoms; R.sub.4 and R.sub.5 independently represent hydrogen or an alkyl group; and p, q and r, which may be the same or different, each is a polymerization ratio; p ranges from 10 to 90, q ranges from 10 to 90 and r ranges from 0 to 50.

REFERENCES:
patent: 4246374 (1981-01-01), Kopchik
patent: 4524121 (1985-06-01), Gleim et al.
patent: 4569897 (1986-02-01), Kalyanaraman
patent: 4837124 (1989-06-01), Wu et al.
patent: 5019488 (1991-05-01), Mammato et al.
patent: 5227280 (1993-07-01), Jubinsky et al.
patent: 5248725 (1993-09-01), Koyama et al.
patent: 5420209 (1995-05-01), Boutevin et al.
patent: 5879853 (1999-03-01), Azuma

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