Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-01-11
2005-01-11
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S281100, C430S284100, C430S285100, C430S286100, C430S322000, C430S330000
Reexamination Certificate
active
06841332
ABSTRACT:
A photoresist compound or composition achieves a uniform volume growth in a chemical expansion on a chemically expandable photomask during a method for structuring a layer of the photoresist compound. The photoresist composition comprises a film-forming polymer having molecular groups that can be converted into alkali-soluble groups through acid-catalyzed separation reactions, and reactive molecular groups that can react with an expansion component so as to form a chemical bond. In addition, the photoresist composition comprises a photoacid generator that releases an acid upon exposure with radiation from a suitable wavelength range, and a thermoacid generator that releases an acid when supplied with sufficient thermal energy.
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Hiroshi, “Deep-UV Resists: Evolution and Status”,Solid State Technology, Jul. 1996, pp. 164-166, 168, 170, 173.
Falk Gertrud
Kuehn Eberhard
Richter Ernst Christian
Sebald Michael
Gilliam Barbara L.
Infineon Technology AG
Schiff & Hardin LLP
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