Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-02-22
2005-02-22
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S326000, C430S907000
Reexamination Certificate
active
06858379
ABSTRACT:
New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.
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Cameron James F.
Pohlers Gerhard
Szmanda Charles R.
Taylor Gary N.
Zampini Anthony
Ashton Rosemary
Corless Peter F.
Edwards & Angell LLP
Prickey Darryl P.
Shipley Company L.L.C.
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