Photoresist compositions based on hydroxystyrene copolymers

Details Photoresist compositions based on hydroxystyrene copolymers Photoresist compositions based on hydroxystyrene copolymers

1989-07-27

1990-05-29

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430197, 430286, 430287, 430302, 430330, 430311, 430322, G03C 516, G03C 168

Patent

active

049295373

ABSTRACT:
Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer. Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.

REFERENCES:
patent: 4689371 (1987-08-01), Elmore et al.
patent: 4740451 (1988-04-01), Kohara
patent: 4775730 (1988-10-01), Gupta
patent: 4824758 (1989-04-01), Gupta et al.
patent: 4857601 (1989-08-01), Gupta
patent: 4869994 (1989-09-01), Gupta et al.

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