Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2011-08-23
2011-08-23
Kelly, Cynthia H (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100
Reexamination Certificate
active
08003309
ABSTRACT:
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.
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Sanders et al., “Fluoroalcohol Material with Tailored Interfacial Properties for Immersion Lithography”, Proc of SPIE, 2007, pp. 651904-1-651904-12, vol. 6519, USA.
Sanders et al., “Topcoat-free photoresists for 193nm immersion lithography”, Microlithography World, Aug. 2002, pp. 8-13, vol. 16, No. 3, USA.
Ito Hiroshi
Sanders Daniel Paul
Sundberg Linda Karin
Canaan Karen
CanaanLaw, P.C.
International Business Machines - Corporation
Johnson Connie P
Kelly Cynthia H
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