Photoresist compositions and methods of forming a pattern...

Details Photoresist compositions and methods of forming a pattern... Photoresist compositions and methods of forming a pattern...

2007-10-10

2009-02-17

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000, C430S921000, C430S922000

Reexamination Certificate

active

07491484

ABSTRACT:
In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a positively charged sulfonium ion and a negatively charged sulfonate ion having a hydrophilic carboxylic group, about 4 to about 10 percent by weight of a resin, and a solvent.

REFERENCES:
patent: 7262321 (2007-08-01), Harada et al.
patent: 2006/0147836 (2006-07-01), Hatakeyama et al.
patent: 2006/0234160 (2006-10-01), Hasegawa et al.
patent: 2007/0027336 (2007-02-01), Yoshida et al.
patent: 2007/0141512 (2007-06-01), Wada et al.
patent: 2005-173549 (2005-06-01), None
patent: 2005-266799 (2005-09-01), None
patent: 2005-309407 (2005-11-01), None

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