Photoresist compositions and method

Details Photoresist compositions and method Photoresist compositions and method

1985-04-22

1986-09-09

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430911, 430283, 430909, 430916, 430921, 430925, 430330, 430327, 430331, G03C 516, G03C 174

Patent

active

046109528

ABSTRACT:
Water soluble blends are provided of alkanolacrylamide, water soluble hydroxyl containing film forming organic oligomer and an effective amount of an onium salt photoinitiator. These photocurable compositions can be used as photoresists.

REFERENCES:
patent: 2927023 (1956-08-01), Martin
Photoinitiated Cationic Polymerization with Triarylsulfonium Salts, Crivello et al., Journal of Polymer Science: Polymer Chemistry Edition, vol. 17, pp. 977-999 (1979).
Triarylsulfonium Salts as Photoinitiators of Free Radical and Cationic Polymerization, Crivello et al, Journal of Polymer Science: Polymer Letters Edition, vol. 17, pp. 759-764 (1979).
Synthesis and Properties of Photopolymer Printing Plates for a Printing Master Plate by Modification of Polyvinyl Alcohol, Nakane et al., American Chemical Society, 1980, ACS Symposium Series 121, pp. 264-279.
Diaryliodonium Salts, A New Class of Photoinitiators for Cationic Polymerization, Crivello et al, Macromolecules, vol. 10, pp. 1307-1315 (1977).

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