Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-09-18
1999-03-02
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302851, 430908, 430916, 526271, 5263171, 5263285, 5263297, G03C 1492, C03F22010
Patent
active
058768998
ABSTRACT:
A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.
REFERENCES:
patent: 4139391 (1979-02-01), Ikeda et al.
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 5128232 (1992-07-01), Thackery et al.
patent: 5362600 (1994-11-01), Sinta et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5492793 (1996-02-01), Breyta et al.
patent: 5587274 (1996-12-01), Kishida et al.
Brainard Robert L.
DoCanto Manuel
Szmanda Charles R.
Taylor Gary N.
Ashton Rosemary
Corless Peter F.
Frickey Darryl P.
Goldberg Robert L.
McPherson John A.
LandOfFree
Photoresist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-421076