Photoresist composition with photosensitive base generator

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

4302801, 4302811, 430311, 430322, G03C 1492

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active

055455093

ABSTRACT:
The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.

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