Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-02-01
1996-08-13
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302801, 4302811, 430311, 430322, G03C 1492
Patent
active
055455093
ABSTRACT:
The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.
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Cameron James F.
Frechet Jean M. J.
Leung Man-Kit
MacDonald Scott A
Niesert Claus-Peter
Chapman Mark
International Business Machines - Corporation
Martin Robert B.
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