Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-08-02
2011-08-02
Kelly, Cynthia H (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S322000, C430S920000, C430S922000, C430S927000
Reexamination Certificate
active
07989136
ABSTRACT:
A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
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Methyl Cellosolve Acetate, NIOSH Manual of Analytical Methods (NMAM), Aug. 15, 1994.
Jung Doo-hee
Koo Ki-Hyuk
Lee Hi-Kuk
Park Jeong-Min
Yoon Hyoc-Min
Cantor & Colburn LLP
Dongjin Semichem Co., Ltd.
Eoff Anca
Kelly Cynthia H
Samsung Electronics Co,. Ltd.
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