Photoresist composition and method of forming a photoresist...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S322000, C430S920000, C430S922000, C430S927000

Reexamination Certificate

active

07989136

ABSTRACT:
A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.

REFERENCES:
patent: 5227422 (1993-07-01), Mitsuji et al.
patent: 5529885 (1996-06-01), Ochiai et al.
patent: 5609988 (1997-03-01), Miyamoto et al.
patent: 6110641 (2000-08-01), Trefonas et al.
patent: 6699638 (2004-03-01), Kita
patent: 08-334893 (1996-12-01), None
patent: 1996-011701 (1996-04-01), None
patent: 2005-0031253 (2005-04-01), None
Methyl Cellosolve Acetate, NIOSH Manual of Analytical Methods (NMAM), Aug. 15, 1994.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photoresist composition and method of forming a photoresist... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist composition and method of forming a photoresist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist composition and method of forming a photoresist... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2690140

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.