Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-05-27
2008-09-02
Visconti, Geraldina (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S322000, C430S323000, C430S325000, C430S914000, C430S927000, C430S904000, C430S905000
Reexamination Certificate
active
07419759
ABSTRACT:
The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.
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patent: WO 01/95034 (2001-12-01), None
Kim Jae-Ho
Kim Kyoung-Mi
Wang Youn-Kyung
Youn Yeu-Young
Samsung Electronics Co,. Ltd.
Visconti Geraldina
Volentine & Whitt PLLC
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