Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-12-08
2009-11-10
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S330000
Reexamination Certificate
active
07615338
ABSTRACT:
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to all semiconductor processes.
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Korean Intellectual Property Office Notice of Rejection, for Korean Patent Application No. 10-2005-0041957, dated Nov. 21, 2006.
Lee Geun Su
Lee Seung Hun
Moon Seung Chan
Eoff Anca
Hynix / Semiconductor Inc.
Kelly Cynthia H
Marshall & Gerstein & Borun LLP
Youngchang Chemical Co., Ltd.
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