Photoresist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430330, G03C 1727

Patent

active

052866114

ABSTRACT:
Photocurable and solvent-developable compositions based on photopolymerizable (meth)acrylates, a photoinitiator for (meth)acrylates, an organic polymeric binder which comprises free carboxyl groups and has an acid number of at least 60, a blocked polyisocyanate crosslinking agent which has a cleavage temperature of at least 100.degree. C., and an inert solvent in an amount such that the photocurable composition is pourable, are described.

REFERENCES:
patent: 4621043 (1986-11-01), Gervay
patent: 4961960 (1990-10-01), Iimure

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