Photopolymerizable compositions including squarylium compounds

Details Photopolymerizable compositions including squarylium compounds Photopolymerizable compositions including squarylium compounds

1997-10-07

1999-12-28

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430915, 430916, 430920, 430944, 522 16, 522 26, G03C 173

Patent

active

060079657

ABSTRACT:
The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presensitized plate for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.

REFERENCES:
patent: 5190849 (1993-03-01), Santoh et al.
patent: 5275917 (1994-01-01), Inaishi et al.
patent: 5527659 (1996-06-01), Yamaoka et al.
Grant, "Hackh's Chemical Dictionary", 4 ed. p. 15, 1969.

Affiliated with

Also associated with

Rating

Photopolymerizable compositions including squarylium compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable compositions including squarylium compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable compositions including squarylium compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2381176