Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1985-03-15
1987-05-19
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430330, 430331, 430309, 430912, 430281, 430915, 430302, G03C 516, G03C 168, G03F 726
Patent
active
046668241
ABSTRACT:
The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photooxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.
REFERENCES:
patent: 2996515 (1961-08-01), Moore et al.
patent: 3597343 (1971-08-01), Delzenne et al.
patent: 3647467 (1972-03-01), Grubb
patent: 3697280 (1972-10-01), Strilko
patent: 3721566 (1973-03-01), Laridon et al.
patent: 3847609 (1974-11-01), Breslow et al.
patent: 3924520 (1975-12-01), Boardman et al.
patent: 3926642 (1975-12-01), Breslow et al.
patent: 4271259 (1981-06-01), Breslow et al.
patent: 4272610 (1981-06-01), Breslow et al.
patent: 4315998 (1982-02-01), Neckers et al.
patent: 4436715 (1984-03-01), Schaap et al.
K. Gollnick and G. O. Schenck, Chapter 10 in 1,4-Cyclo-addition Reactions, J. Hamer, Ed., Academic Press Inc., New York, N.Y., 1967.
T. Matsuura and I. Saito, Chapter 7 in Photochemistry of Heterocyclic Compounds, O. Buchardt, Ed., John Wiley & Sons, Inc., New York, N.Y. 1976.
H. H. Wasserman, Ann. N.Y. Acad. Sci., vol. 171, pp. 108-119 (1970).
Hamilton Cynthia
Hercules Incorporated
Kittle John E.
Patterson Joanne W.
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