Photopolymer composition suitable for lithographic printing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S271100, C430S283100

Reexamination Certificate

active

07955776

ABSTRACT:
Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2and X3are independently selected from straight-chain or cyclic C4-C12alkylene and C6-C10arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2and R3are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2and R3, and (2) n>2 in at least one of the groups R1, R2and R3, and (3) at least one group R6is different from H in formula (III).

REFERENCES:
patent: 4019972 (1977-04-01), Faust
patent: 4229658 (1980-10-01), Gonser
patent: 5346805 (1994-09-01), Kondo et al.
patent: 0582753 (1992-11-01), None
patent: 0 582 753 (1995-12-01), None
patent: 2001117217 (2001-04-01), None
patent: 2004/049068 (2004-06-01), None
patent: 2004/049069 (2004-06-01), None

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