Photomask having small pitch images of openings for...

Details Photomask having small pitch images of openings for... Photomask having small pitch images of openings for...

2005-03-29

2005-03-29

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000

Reexamination Certificate

active

06872510

ABSTRACT:
A photomask having small pitch images of openings for fabricating an opening of a semiconductor memory device includes a plurality of images of openings arranged in a row direction with a predetermined pitch to be used to transfer the images of openings onto a photoresist layer, and is used for a photolithographic process employing a photoresist flow process. The distance between the centers of the images of openings arranged in the photomask is larger than the pitch. A photolithographic method for fabricating reduced size openings and a semiconductor memory device having openings fabricated using the same method is also provided.

REFERENCES:
patent: 4762805 (1988-08-01), Cheung et al.
patent: 5691551 (1997-11-01), Eimori
patent: 6284438 (2001-09-01), Choi et al.
patent: 6566041 (2003-05-01), Iwasaki et al.
patent: P1995-0019907 (1995-07-01), None
patent: P1996-0012292 (1996-04-01), None
patent: P1997-0002487 (1997-01-01), None

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